Press Release

Santa Barbara, CA, USA (September 23, 2004) – MultiProbe announces the addition of PicoCurrent™ imaging to our MultiScan™ Atomic Force Probe (AFP). PicoCurrent imaging offers a highly sensitive fault localization technique which, when combined with the parametric extraction ability of the AFP forms a powerful analytical tool.

In the attached AFP image, PicoCurrent imaging reveals variations in conductivity across an IC polished to the tungsten contact level. Low resistance paths to ground show higher current and hence brighter features. Higher resistances are proportionately darker.  Such contrast provides an instant look at the sample layout, allowing process defects like CVD seams and mis-aligned diffusions to be easily and quickly identified. A corresponding diagram shows how the PicoCurrent sensor operates with the AFP to produce such an image.

Extension of the single probe atomic force microscope (AFM) technique to a multiple probe AFP allows the user to perform all necessary measurements to characterize either a failure or to evaluate a process at the contact node level.

MultiProbe develops and manufactures the world’s highest resolution nanoprobing tools. Companies use our instruments to characterize the smallest, high performance semiconductor devices on integrated circuits. MultiProbe is located in Santa Barbara, CA, USA. Visit our website at www.multiprobe.com or email us at info@multiprobe.com and change the way you look at transistors for generations to come.