MP II Probing Head

Overview

After demonstrating its effectiveness on the 45nm technology node, MultiProbe has designed the MP II head to go well beyond into 32nm and 22nm devices. The MP II’s laser feedback control allows users to image and probe, uninterrupted for days, without changing a single probe tip. Using currently available AFP solid tungsten probes, the MP II will image for hours with less than 100nm of total image drift (see a short 30 sec. video), allowing the user ample time to acquire the most demanding data. Used in Failure Analysis (FA), Reliability, Design, and research labs around the world, the Atomic Force Prober has already proven itself as the most reliable, versatile, and capable nanoprober available.

FLEXIBLE MPII HEAD CONFIGURATION A single head allows ultra low-current localization of defects using PicoCurrent imaging.   A two head system provides continuity and 2-terminal via-chain resistance measurements.   Three heads allows transistor curves of SOI n- and p- FETS as well as bulk n-FETS.   Four heads will extract full bulk-device parameters.   Five heads enable “Kelvin” resistance measurements.   A complete 6-head system is used for contacting all critical nodes for eDRAM.

Features

Detailed documentation of the MP II head can be found in the Customer Technical Introduction to the MP II probing head document.

Tech Specs

		Note
Noise	<3nm for -50dB <4nm for -40dB <5nm for -30dB	1
Lateral Resolution	5 nm	2
Vertical Resolution	5 nm	3
Scan Range	35 µm	4
Orthogonality	1 °	5
Contact Duration	10 min	6

Notes:

1. Results are based on the facility floor noise measurements taken using the MultiProbe site qualification procedure
2. Verified using the MultiProbe offset command during an image scan
3. Will image on 5nm feature height sample Results based on a noise floor less than 3nm
4. Monitoring the axial displacement for x,y and z in the ramping calibration suite
5. Measured with a 20µm scan box
6. Results based on 65nm technology after tips have been installed for 24 hours