August 28th, 2008

X-Series Nanoprober

 

Overview

The MultiProbe™ Nanoprober provides conclusive, quantitative electrical measurements to current and future technologies. It reduces Failure Analysis (FA) times from weeks to hours. How?
The MultiProbe™ AFP II Nanoprober combines a rock solid platform with the award-winning, high performance MultiScan™ software for maximum tool efficiency and lab productivity. It's designed for 32nm, 45nm, 65nm, 90nm and larger process technology measurements, and provides simultaneous imaging capabilities in an intuitive, easy to use platform.
The AFP Nanoprober allows analysts to measure the smallest transistors without the need for vacuum chambers. It offers quick sample and probe change capabilities and is free from the threshold shifting effects produced by charged beam exposure techniques used in other tools. Its sharp probes, piezo-electrics nano positioning, and force feedback provide a nanometer resolution map of surface structures, and the ability to place the probes on the desired nodes quickly and with controlled contact force.

 

FLEXIBLE MPII HEAD CONFIGURATION

 

A single head allows ultra low-current localization of defects using PicoCurrent imaging.

 

A two head system provides continuity and 2-terminal via-chain resistance measurements.

 

Three heads allows transistor curves of SOI n- and p- FETS as well as bulk n-FETS.

 

Four heads will extract full bulk-device parameters.

 

Five heads enable "Kelvin" resistance measurements.

 

A complete 6-head system is used for contacting all critical nodes for eDRAM.

Features

 

Other Options

 

Platform: Engineered to provide an ultra stable and compact platform with a small footprint. MultiProbe™ has elevated the probing heads well above the base to increase user access, greatly simplifying sample exchanges and alignment procedures. With this design, samples up to 4" (10cm) can be easily loaded onto a XYZΘ micrometer stage, and each MP II probing head can be positioned anywhere on the sample, even to within 100nm of the other probe tips. The positions of the AFP heads are rigidly fixed to ensure optimum noise performance and to eliminate probe-to-probe and head-to-microscope interferences. Micrometer-driven positioners are raised above the AFP II Nanoprober base and rigidly position the MP II heads over the XYZΘ sample stage. An extruded aluminum post is located at the back of the base to support the AZoom sample-viewing microscope.
Instrumentation Rack: An ergonomic equipment rack puts all the necessary tools within arm's reach of the engineer. Nanoprobing electrical measurements requires low drift, precision probe placement that allows for the flexibility of large range positioning. Weight-bearing sliding shelves and removable panels allow for easy access to the instruments from all angles.
Workstation: Multiple floating monitors offer clean aesthetics as well as increased workspace to the operator.
Facility Requirements: The AFP II Nanoprober enhances the inherent productivity of MultiScan™ software with a design that anticipates the requirements of the user, and fully maximizes today's technology. Facility requirements are minimal for the AFP to be fully functional. Two single-phase outlets rated at 30A (110 or 230V) are required. Vacuum for the sample chuck is provided internally from a floor-mounted pump.